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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZsFDuKxG/ALSpS
Repositóriosid.inpe.br/marciana/2004/01.15.10.14   (acesso restrito)
Última Atualização2014:05.26.13.22.15 (UTC) administrator
Repositório de Metadadossid.inpe.br/marciana/2004/01.15.10.14.28
Última Atualização dos Metadados2018:06.05.01.20.45 (UTC) administrator
Chave SecundáriaINPE-10336-PRE/5837
DOI10.1016/S0925-4005(03)00112-6
ISSN0925-4005
Chave de CitaçãoSilvaTanNasGalJes:2003:UsPlPo
TítuloUse of plasma polymerized highly hydrophobic hexamethyldissilazane (HMDS) films for sensor development
Ano2003
MêsJune
Data de Acesso21 maio 2024
Tipo de Trabalhojournal article
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho190 KiB
2. Contextualização
Autor1 Silva, M. L. P.
2 Tan, Ing Hwie
3 Nascimento Filho, A. P.
4 Galeazzo, E.
5 Jesus, D. P.
Grupo1
2 LAP-INPE-MCT-BR
Afiliação1 Universidade de São Paulo (USP)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Universidade de São Paulo (USP)
4 Universidade de São Paulo (USP)
5 Universidade de São Paulo (USP)
Endereço de e-Mail do Autor1 malu@lsi.usp.br
2 ingtan@plasma.inpe.br
RevistaSensors and Actuators B: Chemical
Volume91
Número1-3
Páginas362-369
Histórico (UTC)2013-02-21 21:06:48 :: administrator -> marciana :: 2003
2013-03-25 11:34:07 :: marciana -> administrator :: 2003
2013-10-15 08:17:17 :: administrator -> marciana :: 2003
2014-05-26 13:22:15 :: marciana -> administrator :: 2003
2018-06-05 01:20:45 :: administrator -> :: 2003
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Tipo de Versãopublisher
Palavras-Chavesilicon
HMDS
plasma
sensor
deposition
ResumoHexamethyldissilazane (HMDS) plasma polymerized films can be used in a wide variety of applications due to the facility on plasma polymerization of HMDS molecule and the high resistance to acid or basic corrosion of the formed film. Nonetheless, the hydrophobic character, as well as the possibility of adsorption of organic molecules, did not receive attention yet. In this work HMDS plasma polymerized films, presenting high organic character, were obtained in order to analyze their properties as sensors for organic compounds in N2 and aqueous solutions. The films showed to be not only highly resistant to corrosion in a wide scan of pH, but also presented high water contact angle (approximately 908). The organic character of the films leads to a high adsorption characteristic for polar and non-polar compounds. The water contact angle measurements vary for 2-propanol aqueous solutions from 908 (0% of 2-propanol) to about 08 (50% of 2-propanol). When HMDS films were deposited on two different substrates, dielectric and porous silicon (PS), two main issues were found. The films suffered degradation by heating and porous silicon was planarized by the plasma deposition, as shown by infrared spectroscopy, optical and Raman microscopy. Deposition on piezoelectric quartz crystal (PQC) showed adsorption of polar and non-polar organic compounds carried by N2 and chloroform aqueous solutions. HMDS films deposited on silicon were electrically characterized showing quickly and reversible response for 2-propanol carried by N2. In saturated environment, the electrical current increases about five times when a range of 5 to 0 V was applied. For n-hexane drops, no reversible electrical characteristics were found. Although some issues were revealed, HMDS highly hydrophobic films showed promising characteristics for sensor development.
ÁreaFISPLASMA
Arranjourlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Use of plasma...
Conteúdo da Pasta docacessar
Conteúdo da Pasta sourcenão têm arquivos
Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
Idiomaen
Arquivo Alvo1-s2.0-S0925400503001126-main.pdf
Grupo de Usuáriosadministrator
marciana
Grupo de Leitoresadministrator
marciana
Visibilidadeshown
Detentor da CópiaSID/SCD
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
Permissão de Atualizaçãonão transferida
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
DivulgaçãoWEBSCI; PORTALCAPES.
Acervo Hospedeirosid.inpe.br/banon/2003/08.15.17.40
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyright creatorhistory descriptionlevel e-mailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype url


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